| CAS NO. 13391-72-5 Dimethyl(dimethylamino)vinylsilane | |
| Product Name | Dimethyl(dimethylamino)vinylsilane |
| Synonyms | (Dimethylamino)dimethylvinylsilane; (Dimethylamino)vinyldimethylsilane; Vinyldimethyl(dimethylamino)silane; N,N-Dimethylvinyldimethylsilanamine; Me₂ViSi–NMe₂ |
| CAS NO. | 13391-72-5 |
| Appearance | Colorless to pale yellow liquid |
| Purity | 95% min |
| MF | C6H15NSi |
| MW | 129.28 g/mol |
| Storage | Preserve in a well-closed container and keep in cool, dry place, avoid light. |
| Package | In fluoride bottle/ Fluoride drums/iron drums/plastic drums/IBC Tank ,etc. |
| Shipment method | By Sea, Air, Courier door to door, etc. |
| Loading Port | China any port, Beijing, Shanghai, Hong Kong etc. |
| Application | 1. Semiconductor ALD/CVD precursor (primary use): Vinyl-functional aminosilane for plasma-enhanced ALD and CVD of silicon carbonitride (SiCN) and carbon-doped SiNx films. The vinyl group (Si–CH=CH₂) is a built-in carbon source that raises film carbon content, enabling low-dielectric-constant SiCN etch-stop/cap layers and tunable film composition in logic interconnects — with halogen-free, self-limiting growth and no NH₄Cl by-product. 2. Low-k / etch-stop film tuning: Delivers carbon-rich SiCN with controlled density, etch selectivity and stress; the vinyl ligand can also crosslink during or after deposition, stabilizing film structure. 3. Silylation & coupling reagent: Combines a labile Si–NMe₂ group (amine-liberating silylation, volatile by-products) with a vinyl handle for hydrosilylation / free-radical coupling — used for surface functionalization, vinyl-functional silicone/PVMS polymer synthesis and nanoparticle modification. |
| Contact | Contact person: James Zhang
Email: james.zhang@dakenchem.com |
Frequently Asked Questions：
What is Dimethyl(dimethylamino)vinylsilane (CAS 13391-72-5)?
It is a vinyl-functional organoaminosilane with the linear formula CH₂=CH–Si(CH₃)₂–N(CH₃)₂ (CAS 13391-72-5, molecular formula C₆H₁₅NSi, MW 129.28). On one silicon center it carries one dimethylamino leaving group, two methyl groups and one vinyl group — a compact, highly volatile liquid used both as a SiCN deposition precursor and as a dual-purpose silylation/coupling reagent.
Is this the same product as (dimethylamino)dimethylvinylsilane?
Yes — (dimethylamino)dimethylvinylsilane, (dimethylamino)vinyldimethylsilane and vinyldimethyl(dimethylamino)silane are the same compound, CAS 13391-72-5. Note it is a different molecule from bis(dimethylamino)methylvinylsilane (CAS 13368-45-1), which carries two dimethylamino groups and one methyl plus one vinyl group. Confirm orders by CAS number.
What is it used for in semiconductor manufacturing?
It is used as a silicon precursor for ALD/CVD of silicon carbonitride (SiCN) and carbon-doped SiNx films. The Si–CH=CH₂ vinyl group acts as a built-in carbon source, so carbon-rich, low-dielectric-constant SiCN films can be grown for etch-stop/cap layers in Cu/low-k interconnects, spacers and passivation, with chlorine-free chemistry.
How does the vinyl group change film behavior compared with plain aminosilanes?
A vinyl ligand contributes more carbon than a methyl group and can participate in crosslinking/incorporation reactions during plasma deposition, shifting film composition toward carbon-rich SiCN. This typically lowers the dielectric constant and changes etch selectivity, density and stress — useful knobs for low-k etch-stop and spacer tuning. It also leaves a polymerizable handle in surface-modification applications.
What purity do you supply?
Our standard grade is 95% min (by GC), with COA per batch, suitable for R&D, pilot evaluation and synthesis use. Higher-assay or tighter-specification batches (controlled moisture, trace metals) for electronic-grade evaluation can be custom produced against your target specification.
What are the key physical properties for process design?
Boiling point about 109 °C; density about 0.77 g/mL at 25 °C. It is a small, highly volatile molecule, convenient for bubbler / vapor-draw delivery. Reference sources do not report a consistent flash-point value, so please rely on the figure in the delivered batch SDS rather than catalog estimates.
How should it be stored and handled?
It is moisture-sensitive: the Si–N bond hydrolyzes with water, releasing dimethylamine. Store tightly sealed under dry nitrogen or argon, cool, dry and dark. Transfer via glovebox or Schlenk/cannula technique with inert-gas-purged lines and cylinders; avoid ignition sources (flammable liquid). See the SDS for full guidance.
What packaging options are available?
Standard packaging is fluoride bottles, fluorinated / iron / plastic drums or IBC tanks according to order quantity. Material is sealed dry under inert conditions before dispatch. Small sealed sample bottles are available for evaluation; cylinders, ampoules and custom fittings can be arranged for production use.
Are COA, SDS and regulatory documents provided? How is it shipped?
Yes — COA and SDS ship with every batch; TDS, REACH/TSCA and origin documents are available on request. It is classified as a flammable, corrosive, moisture-reactive dangerous good (UN 2924 type entries) and is shipped through certified DG channels by air, sea or courier with complete dangerous-goods documentation.
Can I get a sample, custom specification or small-batch supply?
Yes. We support gram-scale samples for process evaluation, custom specification batches, and scale-up to production volumes with stable lead times. Tell us your target application (SiCN etch-stop, carbon-rich SiNx, vinyl-functional silylation…), grade and cylinder type, and we will reply with specification, price, lead time and sample availability — usually within one working day. Contact James Zhang at james.zhang@dakenchem.com.
Application Cases：
Case 1 — Logic Interconnect: Carbon-Rich SiCN Etch-Stop / Cap Layer
In Cu/low-k stacks, the vinyl ligand supplies high carbon content to PEALD SiCN films, lowering dielectric constant while maintaining etch selectivity and copper-barrier performance — targeting the etch-stop/cap layer between low-k levels.
Case 2 — Halogen-Free SiCN Deposition Development
The molecule gives ALD/CVD process teams a single-precursor route to carbon-rich SiCN with no chlorine and no NH₄Cl handling, useful when screening vinyl- vs methyl-aminosilane families for film density and wet-etch-rate tuning.
Case 3 — Vinyl-Functional Surface Silylation
The Si–NMe₂ group silylates silanol surfaces under mild conditions, releasing only volatile dimethylamine, while the vinyl group remains available for subsequent hydrosilylation or radical grafting — used to functionalize silica, fillers and nanoparticles with polymerizable handles.
Case 4 — Vinylsilicone (PVMS) Polymer & Resin Crosslinker
As a vinylsilane building block it participates in free-radical and hydrosilylation cure of vinyl-functional silicones and resins, improving crosslink density and organic–inorganic adhesion in specialty encapsulant and coating formulations.
Case 5 — Low-Temperature Passivation / Barrier Film Research
Its high volatility and moderate boiling point support low-temperature vapor delivery for exploratory SiCN/SiCN-type barrier and passivation films on temperature-sensitive substrates, complementing oxide/nitride barrier stacks in display and packaging R&D.
